Boron-11 in the form of Boron Trifluoride Gas

11B in the form of Boron Trifluoride Gas for Semiconductor Manufacture Boron trifluoride gas is the ideal silicon wafer dopant for the production of highly integrated, high-density microchips. 11BF3 provides for greater efficiency and increased production throughput, and helps to make chips smaller and better. Specification Physical Properties: Material 11B – Boron-11 in the form…

D2O

D2O – Heavy Water Heavy Water (D2O) is used as moderator in CANDU power plants and research reactors and as a dopant for biological and medical applications. Specification Electronic Grade Physical and Chemical Properties: Material Water, enriched in Deuterium (2H) Enrichment D2O > 99,9 at% Conductivity < 2 μS/cm pD-value 6 – 8 Turbidity <…