11B in the form of Boron Trifluoride Gas for Semiconductor Manufacture
Boron trifluoride gas is the ideal silicon wafer dopant for the production of highly integrated, high-density microchips. 11BF3 provides for greater efficiency and increased production throughput, and helps to make chips smaller and better.
Specification
Physical Properties:
| Material | 11B – Boron-11 in the form of Boron Trifluoride Electronic Grade |
| Enrichment | 11B > 99,9 at% |
Chemical Properties:
| Form | BF3 |
| Purity | > 99,99 wt% |
Impurities in vppm
| Ar+O2 | < 25 |
| CO2 | < 25 |
| HF | < 25 |
| N2 | < 25 |
| SiF4 | < 25 |
| SO2 | < 25 |
* Our gas is fully compatible with VLIS-requirements.