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11B in the form of Boron Trifluoride Gas for Semiconductor Manufacture

Boron trifluoride gas is the ideal silicon wafer dopant for the production of highly integrated, high-density microchips. 11BF3 provides for greater efficiency and increased production throughput, and helps to make chips smaller and better.

Specification

Physical Properties:

Material 11B – Boron-11 in the form of Boron Trifluoride Electronic Grade
Enrichment 11B > 99,9 at%

Chemical Properties:

Form BF3
Purity > 99,9 wt%

Impurities in vppm

Ar+O2 < 5
CO2 < 10
HF < 5
N2 < 5
SiF4 < 25
SO2 < 10

* Our gas is fully compatible with VLIS-requirements.

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