11B in the form of Boron Trifluoride Gas for Semiconductor Manufacture Boron trifluoride gas is the ideal silicon wafer dopant for the production of highly integrated, high-density microchips. 11BF3 provides for greater efficiency and increased production throughput, and helps to make chips smaller and better. Specification Physical Properties: Material 11B – Boron-11 in the form…
10B in the form of Boric Acid for the Nuclear Industry Enriched Boric Acid for use as a chemical shim for excess neutron absorption in the primary circuit of PWRs using high burnup or MOX fuel cores. In these PWRs neutron absorption of natural Boric Acid is insufficient. Solubility of Boric Acid limits the boron…
7Li in the the form of Lithium Hydroxide Monohydrate for the Nuclear Industry Enriched Lithium Hydroxide Monohydrate for use as an alkalizing agent in pressurized water reactors. Our Lithium-7 is specifically designed to meet the quality requirements of the nuclear power industry: Grade „X“ is a material of x-tra high purity and enrichment, far exceeding…
D2O – Heavy Water Heavy Water (D2O) is used as moderator in CANDU power plants and research reactors and as a dopant for biological and medical applications. Specification Electronic Grade Physical and Chemical Properties: Material Water, enriched in Deuterium (2H) Enrichment D2O > 99,9 at% Conductivity < 2 μS/cm pD-value 6 – 8 Turbidity <…
